A model for the behaviour of tensile and compressive residual stresses developed in thin films produced by ion beam-assisted deposition techniques

Thin Solid Films

Volumn 467, Issue 1-2, 2004, Pages 275-283

  Knuyt, G ^a  

^a HASSELT UNIVERSITY   (Belgium)

Author keywords

Compressive residual stress; Ion beam assisted deposition technique; Tensile stress; Thin films

Indexed keywords

ABSORBED GAS ATOMS; ELASTIC ENERGIES; ION FLUX; SHADOWING EFFECTS;

ADHESION; ATOMS; DEPOSITION; ELASTICITY; ELECTRIC POTENTIAL; ION BEAMS; MATHEMATICAL MODELS; POISSON RATIO; RESIDUAL STRESSES; SUBSTRATES; TENSILE STRESS;

THIN FILMS;

EID: 4444230499     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.04.050     Document Type: Article

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