Beneficial influence of continuous ion bombardment during reactive sputter deposition of chromium nitride films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 3, 2003, Pages 569-571

  Janssen, G C A M ^a   Hoy, R ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b NETHERLANDS INSTITUTE FOR METALS RESEARCH   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; COMPRESSIVE STRESS; DENSITY (SPECIFIC GRAVITY); FILM GROWTH; HARDNESS TESTING; INDENTATION; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; SPUTTER DEPOSITION; SUBSTRATES; TENSILE STRESS;

CHROMIUM NITRIDE FILM; HIGH QUALITY COATINGS; NANO-INDENTATION;

THICK FILMS;

EID: 0037667664     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1562174     Document Type: Article

References (12)

1. P. H. Mayrhofer, G. Tischler, and C. Mitterer, Surf. Coat. Technol. 142-144, 78 (2001).
2. C. Nouveau, M. A. Djouadi, C. Decès-Peit, P. Beer, and M. Lambertin, Surf. Coat. Technol. 142-144, 94 (2001).
3. H. Hasegawa, A. Kimura, and T. Suzuki, J. Vac. Sci. Technol. A 18, 1038 (2000).
4. X.-M. He et al., J. Vac. Sci. Technol. A 18, 30 (2000).
5. W.-D Münz, L. A. Donohue, and P. Eh. Hovsepian, Surf. Coat. Technol. 125, 269 (2000).
6. N. X. Randall and A. Harris, Wear 245, 196 (2000).
7. T. Hurkmans et al., Surf. Coat. Technol. 114, 52 (1999).
8. C. Rebholz et al., Surf. Coat. Technol. 115, 222 (1999).
9. P. Hones, R. Sanjines, and F. Levy, Surf. Coat. Technol. 94-95, 398 (1997).
10. G. C. A. M. Janssen, J.-D. Kamminga, and W. G. Sloof, Mater. Res. Soc. Symp. Proc. 703, 153 (2002).
11. G. C. A. M. Janssen, Netherlands patent application No. 1019395, November 2001.
12. B. Chapman, Glow Discharge Processes (Wiely, New York, 1980).