Effects of energetic particle bombardment on residual stress, microstrain and grain size of plasma-assisted PVD Cr thin films

Thin Solid Films

Volumn 424, Issue 1, 2003, Pages 103-106

  Hsieh, J H ^a   Li, C ^a   Wu, W ^b   Hochman, R F ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^c Georgia Institute of Technology   (United States)

Author keywords

Cr thin films; Energetic particle bombardment; Ion plating

Indexed keywords

ANNEALING; CHROMIUM; ENERGY TRANSFER; GRAIN SIZE AND SHAPE; ION BOMBARDMENT; PHYSICAL VAPOR DEPOSITION; RESIDUAL STRESSES;

PARTICLE ENERGY;

THIN FILMS;

EID: 0037460353     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00907-0     Document Type: Conference Paper

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