Residual stress control by ion beam assisted deposition

Materials Research Society Symposium - Proceedings

Volumn 396, Issue , 1996, Pages 479-489

  Was, G S ^a   Jones, J W ^a   Parfitt, L ^a   Kalnas, C E ^a   Goldiner, M ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; AMORPHOUS FILMS; ARGON; COMPOSITION; CRYSTALLINE MATERIALS; DENSIFICATION; DENSITY (SPECIFIC GRAVITY); METALLIC FILMS; MICROSTRUCTURE; NEON; PRESSURE EFFECTS; RESIDUAL STRESSES;

CRYSTALLINITY; GAS PRESSURE; ION BEAM ASSISTED DEPOSITION; ION TO ATOM ARRIVAL RATE RATIOS; MONOLITHIC FILMS;

ION BOMBARDMENT;

EID: 0029710411     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (24)