Unified theoretical model for tensile and compressive residual film stress

Thin Solid Films

Volumn 370, Issue 1, 2000, Pages 232-237

  Knuyt, G ^a   Lauwerens, W ^a   Stals, L M ^a  

^a HASSELT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED PARTICLES; COATINGS; COMPRESSIVE STRESS; ELASTICITY; FILM GROWTH; ION BOMBARDMENT; MATHEMATICAL MODELS; PLASTIC DEFORMATION; RESIDUAL STRESSES; TENSILE STRESS;

ELASTIC DEFORMATION; ENERGETIC PARTICLES; ENERGY DENSITY; FILM STRESS;

FILMS;

EID: 0033690660     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00944-5     Document Type: Article

References (20)

1. Windischmann H. Crit. Rev. Solid State Mater. Sci. 17:1992;547.
2. Spaepen F., Shull A.L. Curr. Opin. Solid State Mater. Sci. 1:1996;679.
3. d'Heurle F.M., Harper J.M. Thin Solid Films. 171:1989;81.
4. Thornton J.A., Hoffman D.W. Thin Solid Films. 171:1989;5.
5. Was G.S., Jones J.W., Parfitt L., Kalnas C.E., Goldiner M. Ion-Solid Interactions for Materials Modification and Processing, USA. Poker D.B., Ila D., Cheng Y.-T., Harriott L.R., Sigmon T.W. MRS fall meeting 1995, MRS Symp. Proc. 396:1996;479.
6. Perry A.J. Mater. Sci. Eng. A. 253:1998;310.
7. Roy R.A., Petkie R., Boulding A. J. Mater. Res. 6:1991;80.
8. Hoffman R.W., Gaerttner M.R. J. Vac. Sci. Technol. 17:1980;425.
9. Cuomo J.J., Harper J.M.E., Guarnieri C.R., et al. J. Vac. Sci. Technol. 20:1982;349.
10. Finegan J.D., Hoffman R.W. J. Appl. Phys. 30:1959;597.
11. Doljack F.A., Hoffman R.W. Thin Solid Films. 12:1972;71.
12. Itoh M., Hori M., Nadahara S. J. Vac. Sci. Technol. B. 9:1991;149.
13. Windischmann H. J. Appl. Phys. 62:1987;1800.
14. Windischmann H. J. Vac. Sci. Technol. A. 9:1991;2431.
15. Davis C.A. Thin Solid Films. 226:1993;30.
16. Kamminga J.-D., de Keijser T.H., Delhez R., Mittemeijer E.J. Thin Solid Films. 317:1998;169.
17. Fang C.C., Jones F., Prasad V. J. Appl. Phys. 74:1993;4472.
18. Thornton J.A., Tabock J., Hoffman D.W. Thin Solid Films. 64:1979;111.
19. Girifalco L.A., Weizer V.G. Phys. Rev. 114:1959;697.
20. Misra A., Fayeulle S., Kung H., Mitchell T.E., Nastasi M. Appl. Phys. Lett. 73:1998;891.