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Volumn 61, Issue 2-4, 2001, Pages 175-181

Generation and evolution of residual stresses in physical vapour-deposited thin films

Author keywords

Evaporation; Modelling; Residual stresses; Sputtering; Thin films

Indexed keywords

COMPRESSIVE STRESS; EVAPORATION; MAGNETRON SPUTTERING; PHYSICAL VAPOR DEPOSITION; POROUS MATERIALS; SPUTTER DEPOSITION; STRESS ANALYSIS; TENSILE STRESS; THERMAL STRESS; THIN FILMS; VAPORS;

EID: 0035858440     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(00)00475-9     Document Type: Conference Paper
Times cited : (135)

References (14)
  • 7
    • 0006872192 scopus 로고
    • Dupuy CH, Cachard A, editors. Physics of non-metallic thin films New York: Plenum Publishing Corporation
    • Huffman RW. In: Dupuy CH, Cachard A, editors. Physics of non-metallic thin films. NATO-ASI Series, Series B: Physics, vol. 14. New York: Plenum Publishing Corporation, 1976. p. 273.
    • (1976) NATO-ASI Series, Series B: Physics , vol.14 , pp. 273
    • Huffman, R.W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.