The control of film stress using ionised magnetron sputter deposition

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 39-42

  Chiu, K F ^a   Barber, Z H ^a   Somekh, R E ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Plasmon Data Systems Ltd   (United Kingdom)

Author keywords

Film stress; Ion assisted deposition; Ion bombardment; Magnetron sputtering; Plasma; Thin films

Indexed keywords

ION BEAMS; ION BOMBARDMENT; IONIZATION; MAGNETRON SPUTTERING; PLASMAS; SPUTTER DEPOSITION; STRESSES;

ION ASSISTED DEPOSITION;

FILM GROWTH;

EID: 0032685740     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01565-X     Document Type: Article

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