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Volumn 253, Issue 1-2, 1998, Pages 310-318

Microstructural changes in ion implanted titanium nitride

Author keywords

Ion implantation; Long range effect; Residual stress; Titanium nitride

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL LATTICES; CRYSTAL MICROSTRUCTURE; DISLOCATIONS (CRYSTALS); ELECTRIC CONDUCTIVITY; ELECTRON TRANSPORT PROPERTIES; ION IMPLANTATION; RESIDUAL STRESSES; X RAY DIFFRACTION ANALYSIS;

EID: 0009194329     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5093(98)00742-4     Document Type: Article
Times cited : (20)

References (49)
  • 2
    • 0040034214 scopus 로고
    • D.A. Glocker, S.I. Shah (Eds.), Inst. of Physics Publ., Philadelphia, Sec. XI
    • O. Knotek, A. Schrey, in: D.A. Glocker, S.I. Shah (Eds.), Handbook of Thin Film Process Technol., Inst. of Physics Publ., Philadelphia, 1995, Part 10, Sec. XI.
    • (1995) Handbook of Thin Film Process Technol. , Issue.10 PART
    • Knotek, O.1    Schrey, A.2
  • 9
    • 85162596887 scopus 로고
    • 1979, Metals and Ceramics Information Center
    • MCIC Rept. HB-07 (1979), Metals and Ceramics Information Center, Battelle Columbus Labs. 1 (1976); 2 (1979).
    • (1976) Battelle Columbus Labs. , vol.1
  • 10
    • 85162569823 scopus 로고
    • MCIC Rept. HB-07 (1979), Metals and Ceramics Information Center, Battelle Columbus Labs. 1 (1976); 2 (1979).
    • (1979) Battelle Columbus Labs. , vol.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.