Impact of LER and random dopant fluctuations on FinFET matching performance

IEEE Transactions on Nanotechnology

Volumn 7, Issue 3, 2008, Pages 291-298

  Baravelli, Emanuele ^a   Jurczak, Malgorzata ^b   Speciale, Nicolò ^a   De Meyer, Kristin ^b,c   Dixit, Abhisek ^d  

^a UNIVERSITY OF BOLOGNA   (Italy)

^b IMEC   (Belgium)

^c UNIVERSITY OF LEUVEN   (Belgium)

^d IBM INDIA RESEARCH LAB   (India)

Author keywords

Lithography; MOSFETs; Semiconductor device doping; Simulation; Size control; Stochastic processes

Indexed keywords

COMPUTER SIMULATION; LITHOGRAPHY; MOSFET DEVICES; RANDOM PROCESSES;

SEMICONDUCTOR DEVICE DOPING; SIZE CONTROL;

DOPING (ADDITIVES);

EID: 44049092378     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2008.917838     Document Type: Article

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