A-Si:C:H and a-Si:N:H thin films obtained by PECVD for applications in silicon solar cells

Journal of Electronic Materials

Volumn 37, Issue 6, 2008, Pages 905-911

  Stapinski, T ^a   Swatowska, B ^a  

^a AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

Author keywords

Amorphous silicon carbon; Amorphous silicon nitrogen; PECVD; Solar cells

Indexed keywords

AMORPHOUS SILICON CARBON; AMORPHOUS SILICON NITROGEN; ANTIREFLECTIVE FILMS;

AMORPHOUS SILICON; CARBON; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON SOLAR CELLS;

THIN FILMS;

EID: 42449116075     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-008-0422-7     Document Type: Article

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