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Volumn 229, Issue 3-4, 1997, Pages 233-239
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Wide band gap amorphous silicon-based alloys
a a a b b c
c
Elettrorava SpA
(Italy)
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Author keywords
Amorphous semiconductors; Electronic properties; Silicon carbon alloys; Silicon nitrogen alloys; Structure properties
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Indexed keywords
AMORPHOUS ALLOYS;
AMORPHOUS SILICON;
BINARY MIXTURES;
CHEMICAL VAPOR DEPOSITION;
ELECTRON SPIN RESONANCE SPECTROSCOPY;
ELECTRONIC PROPERTIES;
ELECTRONIC STRUCTURE;
FILM GROWTH;
PLASMA APPLICATIONS;
RAMAN SPECTROSCOPY;
SEMICONDUCTING FILMS;
SILICON ALLOYS;
AMORPHOUS SILICON BASED ALLOYS;
WIDE BAND GAP;
AMORPHOUS FILMS;
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EID: 0031100507
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-4526(96)00851-4 Document Type: Article |
Times cited : (17)
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References (23)
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