Multilayer structures induced by plasma and laser beam treatments on a-Si:H and a-SiC:H thin films

Thin Solid Films

Volumn 383, Issue 1-2, 2001, Pages 230-234

  Mitu, B ^a   Dinescu, G ^a   Dinescu, M ^a   Ferrari, A ^b   Balucani, M ^b   Lamedica, G ^b   Dementjev, A P ^c   Maslakov, K I ^c  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b SAPIENZA UNIVERSITY OF ROME   (Italy)

^c KURCHATOV INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; BEAM PLASMA INTERACTIONS; CARBON NITRIDE; CHEMICAL BONDS; CHEMICAL MODIFICATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; INTERFACES (MATERIALS); SILICON CARBIDE; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON CARBONITRIDES;

AMORPHOUS FILMS;

EID: 0035246790     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01612-6     Document Type: Article

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