Optical and structural properties of amorphous silicon-carbon films for optoelectronic applications

Applied Surface Science

Volumn 238, Issue 1-4 SPEC. ISS., 2004, Pages 367-374

  Stapinski, T ^a   Swatowska, B ^a   Kluska, S ^a   Walasek, E ^a  

^a AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

Author keywords

Amorphous silicon carbon; CVD; Optical properties; Thin films

Indexed keywords

AMORPHOUS FILMS; CHEMICAL BONDS; ENERGY GAP; OPTOELECTRONIC DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROTECTIVE COATINGS; REFRACTIVE INDEX;

ABSORPTION COEFFICIENTS; GAS MIXTURES; GROWTH RATE; PROCESS PARAMETERS;

SILICON COMPOUNDS;

EID: 4644353799     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.05.177     Document Type: Conference Paper

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