Large-area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography

Nanotechnology

Volumn 15, Issue 5, 2004, Pages 639-642

  Prodan, L ^a   Euser, T G ^a   Van Wolferen, H A G M ^a   Bostan, C ^a   De Ridder, R M ^a   Beigang, R ^b   Boller, K J ^a   Kuipers, L ^a,c  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b University of Koblenz Landau   (Germany)

^c FOM INSTITUTE AMOLF   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL LATTICES; ETCHING; FABRICATION; INFRARED RADIATION; INTEGRATED OPTICS; LASER BEAMS; LITHOGRAPHY; PHOTORESISTS; REFLECTIVE COATINGS; REFRACTIVE INDEX; WAVELENGTH DISPERSIVE SPECTROSCOPY;

ANTI REFLECTION COATING; DEEP UV LITHOGRAPHY; LASER INTERFERENCE; PHOTONIC CRYSTALS;

CRYSTALS;

EID: 2642574180     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/5/040     Document Type: Article

References (11)

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