Fabrication of 2-D and 3-D silicon photonic crystals by deep etching

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 8, Issue 4, 2002, Pages 919-927

  Chelnokov, Alexei ^b,c   David, Sylvain ^b   Wang, Kang ^d   Marty, Frederic ^e   Lourtioz, Jean Michel ^a,b  

^a IEEE

^b CNRS   (France)

^c Corning FRC ^*  (France)

^d UNIVERSITÉ PARIS SUD   (France)

^e ESIEE PARIS   (France)

Author keywords

Optical device fabrication; Optical diffraction; Optical planar waveguide components; Photonic crystals

Indexed keywords

CRYSTALS; DIFFRACTIVE OPTICS; OPTICAL DEVICES; OPTICAL WAVEGUIDES; PHOTONS; PLASMA ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE;

DEEP ETCHING; PHOTONIC CRYSTALS;

SEMICONDUCTING SILICON;

EID: 0036662298     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSTQE.2002.801736     Document Type: Article

References (20)

1. S. G. Johnson, S. Fan, P. R. Villeneuve, J. D. Jouannopoulos, and L. A. Kolodziejski, "Guided modes in photonic crystal slabs," Phys. Rev. B, vol. 60, pp. 654-656, 1999.
2. H. Benisty, D. Labilloy, C. Weisbuch, C. J. M. Smith, T. F. Krauss, D. Cassagne, A. Beraud, and C. Jouanin, "Radiation losses of waveguide-based two-dimensional photonic crystals: Positive role of the substrate," Appl. Phys. Lett., vol. 76, pp. 532-534, 2000.
3. T. F. Krauss and R. M. De La Rue, "Optical characterization of waveguide based photonic microstructures," Appl. Phys. Lett., vol. 68, no. 12, pp. 1613-1615, 1996.
4. T. D. Happ, A. Markard, M. Kamp, A. Forschel, S. Anand, J.-L. Gentner, and N. Bouadma, "Nanofabrication of two-dimensional photonic crystal mirrors for 1.5 μm short cavity lasers," J. Vac. Sci. Technol. B, vol. B19, no. 6, 2001.
5. W. Bogaerts, P. Bienstman, D. Taillaert, R. Baets, and D. De Zutter, "Out-of-plane scattering in photonic crystal slabs," IEEE Photon. Technol. Lett., vol. 13, pp. 565-567, June 2001.
6. T. Brunhes, P. Boucaud, S. Sauvage, F. Aniel, J.-M. Lourtioz, C. Hernandez, Y. Campidelli, O. Kermarrec, D. Bensahel, and G. Faini, "Electroluminescence of Si/Ge self-assembled quantum dots grown by chemical vapor deposition," Appl. Phys. Lett., vol. 77, no. 12, pp. 1822-1824, 2000.
7. I. Bormann, K. Brunner, S. Hackenbuchner, G. Zandler, G. Abstreiter, S. Schmult, and W. Wegscheider, "Midinfrared intersubband electroluminescence of Si/SiGe quantum cascade structures," Appl. Phys. Lett., vol. 80, no. 13, pp. 2260-2262, 2002.
8. V. Lehmann and H. Föll, "Formation mechanism and properties of electrochemically etched trenches in n-type silicon." J. Electrochem. Soc., vol. 137, no. 2, pp. 653-659, 1990.
9. U. Grüning, V. Lehmann, S. Ottow, and K. Busch, "Macroporous silicon with a complete two-dimensional photonic band gap centered at 5 □m," Appl. Phys. Lett., vol. 68, no. 6, pp. 747-749, 1996.
10. J. Schilling, R. B. Wehrsporn, A. Birner, F. Muller, R. Hillebrand, U. Gosele, S. W. Leonard, J. P. Mondia, F. Genereux, H. M. van Driel, P. Kramper, V. Sandoghdar, and K. Busch, "A model system for two-dimensional and three-dimensional photonic crystals: Macroporous silicon," J. Opt. A: Pure Appl. Opt., vol. 3, no. 6, pp. S121-S132, 2001.
11. S. Rowson, A. Chelnokov, and J.-M. Lourtioz, "Two-dimensional photonic crystals in macroporous silicon: From mid-infrared to telecommunication wavelengths (1.3-1.5 μm)," J. Lightwave Technol., vol. 17, pp. 1989-1995, Nov. 1999.
12. V. Berger, O. Gauthier-Lafaye, and E. Costard, "Fabrication of a 2-D photonic bandgap by a holographic method," Electron. Lett., vol. 33, p. 425, 1997.
13. S. Rowson, A. Chelnokov, and J.-M. Lourtioz, "Macroporous silicon: Photonic crystal substrates at 1.55 μm," in 25th Eur. Conf. Optical Communications (ECOC'99) Conf. Dig., Nice, France, Sept. 1999, pp. I-240-I-241.
14. J. Schilling, F. Muller, S. Matthias, R. B. Wehrsporn, U. Gosele, and K. Busch, "Three-dimensional photonic crystals based on macroporous silicon with modulated pore diameter," Appl. Phys. Lett., vol. 78, pp. 1180-1182, 2001.
15. W. N. G. Hitchon, Plasma Processes for Semiconductor Fabrication. Cambridge, U.K.: Cambridge Univ. Press, 1999.
16. T. Zijstra, E. van der Drift, M. J. A. de Dood, E. Snoeks, and A. Polman, "Fabrication of two-dimensional photonic crystal waveguides for 1.5μm in silicon by deep anisotropic dry etching," J. Vac. Sci. Technol. B, vol. B17, no. 6, pp. 2734-2739, 1999.
17. C. C. Cheng and A. Scherer, "Fabrication of photonic band-gap crystals," J. Vac. Sci. Technol. B, vol. B13, pp. 2696-2700, 1995.
18. H. Yamaguchi, A. Shimase, H. Haraichi, and T. Miyauchi, "Characteristics of silicon removal by fine focused gallium ion beam," J. Vac Sci. and Technol. B, vol. B3, pp. 71-74, 1985.
19. A. Chelnokov, K. Wang, S. Rowson, P. Garoche, and J.-M. Lourtioz, "Near-infrared Yablonovite-like photonic crystals by focused-ion-beam etching of macroporous silicon," Appl. Phys. Lett., vol. 77, no. 19, pp. 2943-2945, 2000.
20. K. Wang, A. Chelnokov, S. Rowson, P. Garoche, and J.-M. Lourtioz, "Focused-ion-beam etching in macroporous silicon to realize three-dimensional photonic crystals," J. Phys. D: Appl. Phys., vol. 33, pp. L119-L123, 2000.