New route to three-dimensional photonic bandgap materials: Silicon double inversion of polymer templates

Advanced Materials

Volumn 18, Issue 4, 2006, Pages 457-460

  Tétreault, Nicolas ^a   Von Freymann, Georg ^a,b,c   Deubel, Markus ^b,c   Hermatschweiler, Martin ^b,c   Pérez Willard, Fabian ^b   John, Sajeev ^a   Wegener, Martin ^b,c   Ozin, Geoffrey A ^a  

^a UNIVERSITY OF TORONTO   (Canada)

^b UNIVERSITY OF KARLSRUHE   (Germany)

^c KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; COST EFFECTIVENESS; HOLOGRAPHY; LASERS; LITHOGRAPHY; SILICON; SYNTHESIS (CHEMICAL);

BANDGAPS; FILLING FRACTION; HOLOGRAPHIC LASER; PHOTORESIST TEMPLATES;

PHOTONS;

EID: 33644536101     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200501674     Document Type: Article

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