Deep reactive ion etching and focused ion beam combination for nanotip fabrication

Materials Science and Engineering C

Volumn 26, Issue 2-3, 2006, Pages 164-168

  Villanueva, G ^a   Plaza, J A ^a   Sanchez Amores A ^a   Bausells, J ^a   Martinez E ^b   Samitier, J ^b   Errachid, A ^b  

^a INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^b Nanobioengineering Research Laboratory CREBEC   (Spain)

Author keywords

DRIE; FIB; Silicon tips

Indexed keywords

ASPECT RATIO; ION BEAMS; SILICON;

DEEP REACTIVE ION ETCHING; FIB; SILICON TIPS;

REACTIVE ION ETCHING;

EID: 32844471560     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msec.2006.01.002     Document Type: Conference Paper

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