Low temperature metal induced crystallization of amorphous silicon using a Ni solution

Journal of Applied Physics

Volumn 82, Issue 11, 1997, Pages 5865-5867

  Yoon, Soo Young ^a   Kim, Ki Hyung ^a   Kim, Chae Ok ^a   Oh, Jae Young ^b   Jang, Jin ^b  

^a Hanyang University   (South Korea)

^b Kyung Hee University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005455096     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366455     Document Type: Article

References (11)

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