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Volumn 451-452, Issue , 2004, Pages 328-333

Polycrystalline silicon films by aluminium-induced crystallisation: Growth process vs. silicon deposition method

Author keywords

Aluminium induced crystallisation; Large grain; Plasma enhanced CVD; Silicon; Sputtering; Thin film

Indexed keywords

ANNEALING; CRYSTALLIZATION; DEPOSITION; ELECTRON BEAMS; EVAPORATION; GRAIN SIZE AND SHAPE; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; POLYSILICON; SCANNING ELECTRON MICROSCOPY;

EID: 17644437435     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.10.121     Document Type: Conference Paper
Times cited : (49)

References (6)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.