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Volumn 451-452, Issue , 2004, Pages 328-333
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Polycrystalline silicon films by aluminium-induced crystallisation: Growth process vs. silicon deposition method
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Author keywords
Aluminium induced crystallisation; Large grain; Plasma enhanced CVD; Silicon; Sputtering; Thin film
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Indexed keywords
ANNEALING;
CRYSTALLIZATION;
DEPOSITION;
ELECTRON BEAMS;
EVAPORATION;
GRAIN SIZE AND SHAPE;
OXIDATION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYCRYSTALLINE MATERIALS;
POLYSILICON;
SCANNING ELECTRON MICROSCOPY;
ALUMINIUM-INDUCED CRYSTALLIZATION;
LARGE GRAINS;
THIN FILMS;
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EID: 17644437435
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2003.10.121 Document Type: Conference Paper |
Times cited : (49)
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References (6)
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