Low-temperature stress-assisted germanium-induced crystallization of silicon-germanium alloys on flexible polyethylene terephtalate substrates

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 3, 2004, Pages 856-858

  Hekmatshoar, B ^a   Shahrjerdi, D ^a   Mohajerzadeh, S ^a   Khakifirooz, A ^b   Robertson, M ^c   Tonita, A ^c   Bennett, J C ^c  

^a UNIVERSITY OF TEHRAN   (Iran)

^b Massachusetts Institute of Technology   (United States)

^c ACADIA UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

METAL-INDUCED CRYSTALLIZATION (MIC); PARTIAL CRYSTALLIZATION; THERMAL EVAPORATION; THIN-FILM TRANSISTORS (TFT);

ANNEALING; CRYSTALLIZATION; EVAPORATION; GERMANIUM; HIGH TEMPERATURE OPERATIONS; NUCLEATION; OPTIMIZATION; PARAMETER ESTIMATION; POLYETHYLENE TEREPHTHALATES; RESIDUAL STRESSES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THERMODYNAMICS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

SILICON ALLOYS;

EID: 3142529279     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1705581     Document Type: Conference Paper

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