-
1
-
-
26244451229
-
-
RMPHAT 0034-6861 10.1103/RevModPhys.77.489.
-
K. Ostrikov, Rev. Mod. Phys. RMPHAT 0034-6861 10.1103/RevModPhys.77.489 77, 489 (2005).
-
(2005)
Rev. Mod. Phys.
, vol.77
, pp. 489
-
-
Ostrikov, K.1
-
2
-
-
34248993658
-
-
JPAPBE 0022-3727 10.1088/0022-3727/40/8/S09.
-
U. Cvelbar and M. Mozetic, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/40/8/S09 40, 2300 (2007).
-
(2007)
J. Phys. D
, vol.40
, pp. 2300
-
-
Cvelbar, U.1
Mozetic, M.2
-
3
-
-
33748081438
-
-
VACUAV 0042-207X 10.1016/j.vacuum.2006.01.025.
-
K. Ostrikov, J. D. Long, P. P. Rutkevych, and S. Xu, Vacuum VACUAV 0042-207X 10.1016/j.vacuum.2006.01.025 80, 1126 (2006).
-
(2006)
Vacuum
, vol.80
, pp. 1126
-
-
Ostrikov, K.1
Long, J.D.2
Rutkevych, P.P.3
Xu, S.4
-
4
-
-
34249003417
-
-
JPAPBE 0022-3727 10.1088/0022-3727/40/8/S18.
-
M. Keidar, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/40/8/S18 40, 2388 (2007).
-
(2007)
J. Phys. D
, vol.40
, pp. 2388
-
-
Keidar, M.1
-
5
-
-
0035476923
-
-
JAPIAU 0021-8979 10.1063/1.1398600.
-
K. Takechi and M. A. Lieberman, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1398600 90, 3205 (2001).
-
(2001)
J. Appl. Phys.
, vol.90
, pp. 3205
-
-
Takechi, K.1
Lieberman, M.A.2
-
6
-
-
33749338220
-
-
PHPAEN 1070-664X 10.1063/1.2355428.
-
S. Z. Li, J. P. Lim, J. G. Kang, and H. S. Uhm, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.2355428 13, 093503 (2006).
-
(2006)
Phys. Plasmas
, vol.13
, pp. 093503
-
-
Li, S.Z.1
Lim, J.P.2
Kang, J.G.3
Uhm, H.S.4
-
7
-
-
0037350284
-
-
PHPAEN 1070-664X 10.1063/1.1542613.
-
S. Cho and M. A. Lieberman, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.1542613 10, 882 (2003).
-
(2003)
Phys. Plasmas
, vol.10
, pp. 882
-
-
Cho, S.1
Lieberman, M.A.2
-
8
-
-
33846708932
-
-
PPPLA6 1612-8850 10.1002/ppa200600070.
-
K. Ostrikov, H. J. Yoon, A. E. Rider, and S. V. Vladimirov, Plasma Processes Polym. PPPLA6 1612-8850 10.1002/ppap.200600070 4, 27 (2007).
-
(2007)
Plasma Processes Polym.
, vol.4
, pp. 27
-
-
Ostrikov, K.1
Yoon, H.J.2
Rider, A.E.3
Vladimirov, S.V.4
-
9
-
-
0036137198
-
-
JAPIAU 0021-8979 10.1063/1.1421038.
-
S. F. Yoon, K. H. Tan, Rusli, and J. Ahn, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1421038 91, 40 (2002).
-
(2002)
J. Appl. Phys.
, vol.91
, pp. 40
-
-
Yoon, S.F.1
Tan, K.H.2
Rusli3
Ahn, J.4
-
10
-
-
0035929750
-
-
JPAPBE 0022-3727 10.1088/0022-3727/34/20/201.
-
A. B. Murphy, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/34/20/201 34, R151 (2001).
-
(2001)
J. Phys. D
, vol.34
, pp. 151
-
-
Murphy, A.B.1
-
11
-
-
1642321079
-
-
JAPIAU 0021-8979 10.1063/1.1642762.
-
I. B. Denysenko, S. Xu, J. D. Long, P. P. Rutkevych, N. A. Azarenkov, and K. Ostrikov, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1642762 95, 2713 (2004).
-
(2004)
J. Appl. Phys.
, vol.95
, pp. 2713
-
-
Denysenko, I.B.1
Xu, S.2
Long, J.D.3
Rutkevych, P.P.4
Azarenkov, N.A.5
Ostrikov, K.6
-
12
-
-
2942608204
-
-
PHPAEN 1070-664X 10.1063/1.1688334.
-
P. Chabert, J. L. Raimbault, J. M. Rax, and M. A. Lieberman, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.1688334 11, 1775 (2004).
-
(2004)
Phys. Plasmas
, vol.11
, pp. 1775
-
-
Chabert, P.1
Raimbault, J.L.2
Rax, J.M.3
Lieberman, M.A.4
-
13
-
-
0035248792
-
-
PSTEEU 0963-0252 10.1088/0963-0252/10/1/310.
-
J. T. Gudmundsson, Plasma Sources Sci. Technol. PSTEEU 0963-0252 10.1088/0963-0252/10/1/310 10, 76 (2001).
-
(2001)
Plasma Sources Sci. Technol.
, vol.10
, pp. 76
-
-
Gudmundsson, J.T.1
-
14
-
-
0013193561
-
-
JAPIAU 0021-8979 10.1063/1.371071, ();, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.67.036406 67, 036406 (2003).
-
K. N. Ostrikov, M. Y. Yu, and H. Sugai, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.371071 86, 2425 (1999); S. V. Vladimirov, K. Ostrikov, M. Y. Yu, and G. E. Morfill, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.67.036406 67, 036406 (2003).
-
(1999)
J. Appl. Phys.
, vol.86
, pp. 2425
-
-
Ostrikov, K.N.1
Yu, M.Y.2
Sugai, H.3
Vladimirov, S.V.4
Ostrikov, K.5
Yu, M.Y.6
Morfill, G.E.7
-
16
-
-
40149098464
-
-
Principles of Plasma Discharges and Materials Processing (Wiley, New York),.
-
M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994), p. 306.
-
(1994)
, pp. 306
-
-
Lieberman, M.A.1
Lichtenberg, A.J.2
-
20
-
-
20844438708
-
-
PHPAEN 1070-664X 10.1063/1.1888325.
-
H. C. Kim and J. K. Lee, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.1888325 12, 053501 (2005).
-
(2005)
Phys. Plasmas
, vol.12
, pp. 053501
-
-
Kim, H.C.1
Lee, J.K.2
-
21
-
-
0008819756
-
-
APPLAB 0003-6951 10.1063/1.125685.
-
S. H. Seo, S. S. Kim, J. I. Hong, C. S. Chang, and H. Y. Chang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.125685 76, 149 (2000).
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 149
-
-
Seo, S.H.1
Kim, S.S.2
Hong, J.I.3
Chang, C.S.4
Chang, H.Y.5
-
22
-
-
0032136550
-
-
PSTEEU 0963-0252 10.1088/0963-0252/7/3/011.
-
J. T. Gudmundsson, Plasma Sources Sci. Technol. PSTEEU 0963-0252 10.1088/0963-0252/7/3/011 7, 330 (1998).
-
(1998)
Plasma Sources Sci. Technol.
, vol.7
, pp. 330
-
-
Gudmundsson, J.T.1
-
23
-
-
33845400616
-
-
RMPHAT 0034-6861 10.1103/RevModPhys.12.87.
-
M. J. Druyvesteyn and F. M. Penning, Rev. Mod. Phys. RMPHAT 0034-6861 10.1103/RevModPhys.12.87 12, 87 (1940).
-
(1940)
Rev. Mod. Phys.
, vol.12
, pp. 87
-
-
Druyvesteyn, M.J.1
Penning, F.M.2
-
24
-
-
0034301294
-
-
JPAPBE 0022-3727 10.1088/0022-3727/33/19/101.
-
R. J. Carman and R. P. Mildren, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/33/19/101 33, L99 (2000).
-
(2000)
J. Phys. D
, vol.33
, pp. 99
-
-
Carman, R.J.1
Mildren, R.P.2
-
25
-
-
34547591540
-
-
PHPAEN 1070-664X 10.1063/1.2749235.
-
Y. Ren, J. D. Long, and S. Xu, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.2749235 14, 073301 (2007).
-
(2007)
Phys. Plasmas
, vol.14
, pp. 073301
-
-
Ren, Y.1
Long, J.D.2
Xu, S.3
-
26
-
-
0035335474
-
-
PHPAEN 1070-664X 10.1063/1.1343887.
-
S. Xu, K. N. Ostrikov, Y. Li, E. L. Tsakadze, and I. R. Jones, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.1343887 8, 2549 (2001).
-
(2001)
Phys. Plasmas
, vol.8
, pp. 2549
-
-
Xu, S.1
Ostrikov, K.N.2
Li, Y.3
Tsakadze, E.L.4
Jones, I.R.5
-
27
-
-
32844460931
-
-
VACUAV 0042-207X 10.1016/j.vacuum.2005.07.010.
-
S. Xu, K. Ostrikov, J. D. Long, and S. Y. Huang, Vacuum VACUAV 0042-207X 10.1016/j.vacuum.2005.07.010 80, 621 (2006).
-
(2006)
Vacuum
, vol.80
, pp. 621
-
-
Xu, S.1
Ostrikov, K.2
Long, J.D.3
Huang, S.Y.4
-
28
-
-
0029184886
-
-
JAPNDE 0021-4922 10.1143/JJAP.34.261.
-
E. Gogolides, D. Mary, A. Rhallabi, and G. Turban, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.34.261 34, 261 (1995).
-
(1995)
Jpn. J. Appl. Phys., Part 1
, vol.34
, pp. 261
-
-
Gogolides, E.1
Mary, D.2
Rhallabi, A.3
Turban, G.4
-
29
-
-
0031478108
-
-
JUPSAU 0031-9015 10.1143/JPSJ.66.1335.
-
H. Amemiya, J. Phys. Soc. Jpn. JUPSAU 0031-9015 10.1143/JPSJ.66.1335 66, 1335 (1997).
-
(1997)
J. Phys. Soc. Jpn.
, vol.66
, pp. 1335
-
-
Amemiya, H.1
-
30
-
-
0021481365
-
-
JPAPBE 0022-3727 10.1088/0022-3727/17/8/026.
-
K. Tachibana, M. Nishida, H. Harima, and Y. Urano, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/17/8/026 17, 1727 (1984).
-
(1984)
J. Phys. D
, vol.17
, pp. 1727
-
-
Tachibana, K.1
Nishida, M.2
Harima, H.3
Urano, Y.4
-
31
-
-
23044435393
-
-
PPPLA6 1612-8850 10.1002/ppa200400094, ();, Vacuum VACUAV 0042-207X 10.1016/j.vacuum.2006.01.025 80, 1126 (2006).
-
S. Xu, J. D. Long, L. Sim, C. H. Diong, and K. Ostrikov, Plasma Processes Polym. PPPLA6 1612-8850 10.1002/ppap.200400094 2, 373 (2005); K. Ostrikov, J. D. Long, P. P. Rutkevych, and S. Xu, Vacuum VACUAV 0042-207X 10.1016/j.vacuum.2006.01.025 80, 1126 (2006).
-
(2005)
Plasma Processes Polym.
, vol.2
, pp. 373
-
-
Xu, S.1
Long, J.D.2
Sim, L.3
Diong, C.H.4
Ostrikov, K.5
Ostrikov, K.6
Long, J.D.7
Rutkevych, P.P.8
Xu, S.9
-
32
-
-
33751558978
-
-
APPLAB 0003-6951 10.1063/1.2388941, ();, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2040000 98, 064304 (2005).
-
I. Levchenko, K. Ostrikov, and E. Tam, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2388941 89, 223108 (2006); I. Levchenko, K. Ostrikov, M. Keidar, and S. Xu, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2040000 98, 064304 (2005).
-
(2006)
Appl. Phys. Lett.
, vol.89
, pp. 223108
-
-
Levchenko, I.1
Ostrikov, K.2
Tam, E.3
Levchenko, I.4
Ostrikov, K.5
Keidar, M.6
Xu, S.7
|