X-ray photoemission and X-ray absorption studies of Hf-silicate dielectric layers

Applied Surface Science

Volumn 253, Issue 5, 2006, Pages 2770-2775

  O'Connor, R ^a   Hughes, G ^a   Glans, P A ^b   Learmonth, T ^b   Smith, K E ^b  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b USA   (United States)

Author keywords

Band offsets; Hafnium silicate; Soft X ray photoemission; X ray absorption

Indexed keywords

ABSORPTION SPECTROSCOPY; ANNEALING; LIGHT ABSORPTION; PHOTOEMISSION; X RAYS;

BAND OFFSETS; HAFNIUM SILICATE; SOFT X-RAY PHOTOEMISSION; X-RAY ABSORPTION;

DIELECTRIC DEVICES;

EID: 37849187690     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.05.053     Document Type: Article

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