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Volumn 21, Issue 4, 2003, Pages 1777-1782

Soft x-ray photoelectron spectroscopy of (HfO2) x(SiO2)1-x hlgh-k gate-dielectric structures

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; COMPOSITION; DIELECTRIC MATERIALS; HAFNIUM COMPOUNDS; INTERFACES (MATERIALS); PHONONS; SILICA; THICK FILMS; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0141569714     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper
Times cited : (33)

References (32)
  • 1
    • 0003552050 scopus 로고    scopus 로고
    • Semiconductor Industry Association, San Jose, CA
    • International Roadmap for Semiconductors (Semiconductor Industry Association, San Jose, CA, 2001); http://public.itrs.net/
    • (2001) International Roadmap for Semiconductors


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.