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Volumn 227-230, Issue PART 1, 1998, Pages 29-33

a-Si:H deposited at high rate on the cathode of a rf-PECVD reactor

Author keywords

Cathode film; Hydrogenated amorphous silicon; Plasma enhanced chemical vapor deposition reactor

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CATHODES; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; HYDROGENATION; ION BOMBARDMENT;

EID: 0032065080     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00328-7     Document Type: Article
Times cited : (9)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.