Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays

IBM Journal of Research and Development

Volumn 43, Issue 1-2, 1999, Pages 73-87

  Kuo, Y ^a   Okajima, K ^a   Takeichi, M ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; INTEGRATED CIRCUIT MANUFACTURE; LIQUID CRYSTAL DISPLAYS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; SUBSTRATES; THIN FILM TRANSISTORS;

ACTIVE-MATRIX LIQUID CRYSTAL DISPLAYS (AMLCD);

PLASMA APPLICATIONS;

EID: 0032677689     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.431.0073     Document Type: Article

References (53)

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