Time of flight secondary ion mass spectroscopy investigation of ultralow- k dielectric modifications in hydrogen and deuterium plasmas

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2695-2701

  Lazzeri, P ^a   Stueber, G J ^b   Oehrlein, G S ^b   McGowan, R ^c   Busch, E ^c   Pederzoli, S ^a   Bersani, M ^a   Anderle, M ^a  

^a ITC IRST   (Italy)

^b UNIVERSITY OF MARYLAND   (United States)

^c SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; PERMITTIVITY; PHOTORESISTS; PLASMA APPLICATIONS; SECONDARY ION MASS SPECTROMETRY;

GAS MIXTURES; INTERCONNECT TECHNOLOGY; PLASMA SPECIES; PLASMADIELECTRIC INTERACTIONS;

DIELECTRIC MATERIALS;

EID: 33845255991     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2382949     Document Type: Article

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