A novel low-damage methane-based plasma ash chemistry (CH 4/Ar): Limiting metal barrier diffusion into porous low-k materials

Electrochemical and Solid-State Letters

Volumn 8, Issue 5, 2005, Pages

  Posseme N ^a   David, T ^b,c   Chevolleau, T ^b   Joubert, O ^b  

^a STMICROELECTRONICS   (France)

^b Joseph Fourier University   (France)

^c CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ASH CHEMISTRY; ASH PLASMAS; ATOMIC LAYERS; PENETRATION;

CARBON; DIFFUSION; PERMITTIVITY; POROUS MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

METHANE;

EID: 18944366782     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1887199     Document Type: Article

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