Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs

Organic Electronics

Volumn 9, Issue 1, 2008, Pages 51-62

  Huang, Z H ^a   Zeng, X T ^a   Sun, X Y ^a   Kang, E T ^b   Fuh, Jerry Y H ^b   Lu, L ^b  

^a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Indium tin oxide; Morphology; OLEDs; Plasma; Surface energy; Surface treatment

Indexed keywords

AMINES; INTERFACIAL ENERGY; MORPHOLOGY; ORGANIC LIGHT EMITTING DIODES (OLED); PLASMAS; SURFACE TREATMENT;

HOLE TRANSPORT LAYERS (HTL); INDIUM TIN OXIDE; PLASMA TREATMENT;

INDIUM COMPOUNDS;

EID: 36849020986     PISSN: 15661199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.orgel.2007.08.002     Document Type: Article

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