Nucleation theory and the early stages of thin film growth

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 5, 2003, Pages

  Ratsch, C ^a   Venables, J A ^b,c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b ARIZONA STATE UNIVERSITY   (United States)

^c UNIVERSITY OF SUSSEX   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FILM GROWTH; NUCLEATION; PARTIAL DIFFERENTIAL EQUATIONS; APPROXIMATION THEORY; BESSEL FUNCTIONS; CHEMICAL VAPOR DEPOSITION; MOLECULAR BEAM EPITAXY; MONTE CARLO METHODS; PROBABILITY DENSITY FUNCTION; PROBABILITY DISTRIBUTIONS; SCANNING TUNNELING MICROSCOPY; TEMPERATURE;

RATE EQUATIONS (RE); JOINT PROBABILITY DISTRIBUTION; KINETIC MONTE CARLO SIMULATION; LEVEL-SET METHOD; MEAN FIELD RATE EQUATIONS; OSTWALD RIPENING; TRANSITION STATE THEORY;

THIN FILMS; SEMICONDUCTOR GROWTH;

EID: 0242509107     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1600454     Document Type: Conference Paper

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