High resolution x-ray photoemission study of plasma oxidation of indium-tin-oxide thin film surfaces

Journal of Applied Physics

Volumn 88, Issue 9, 2000, Pages 5180-5187

  Christou, V ^a   Etchells, M ^a   Renault, O ^a   Dobson, P J ^a   Salata, O V ^a   Beamson, G ^b   Egdell, R G ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b DARESBURY LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000270924     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1312847     Document Type: Article

References (29)

1. H. Köstlin, Festkoerperprobleme XXII, 229 (1982).
2. R. L. Weiher and R. P. Ley, J. Appl. Phys. 37, 299 (1966).
3. I. Hamberg, K. F. Bergren, L. Engstrom, C. G. Granquist, and B. E. Sernelius, Phys. Rev. B 30, 3240 (1984).
4. C. H. L. Weijtens and P. A. C. Vanloon, Thin Solid Films 196, 1 (1991).
5. R. Dounia, A. Kadiri, and M. Addou, J. Chim. Phys. Phys.-Chim. Biol. 89, 2091 (1992).
6. M. D. Benoy and B. Pradeep, Bull. Mater. Sci. 20, 1029 (1997).
7. Y. Dou, R. G. Egdell, D. S. L. Law, N. M. Harrison, and B. G. Searle, J. Phys.: Condens. Matter 10, 8447 (1998).
8. Y. Dou, T. Fishlock, R. G. Egdell, D. S. L. Law, and G. Beamson, Phys. Rev. B 55, R13381 (1997).
9. Y. Dou, R. G. Egdell, T. Walker, D. S. L. Law, and G. Beamson, Surf. Sci. 398, 241 (1998).
10. Electroluminescent Displays, edited by Y. Ono (World Scientific, Singapore, 1995).
11. H. Ishii, K. Sugiyama, E. Ito, and K. Seki, Adv. Mater. 11, 605 (1999).
12. C. P. Shipley, O. V. Salata, and V. Christou, Adv. Mater. 11, 533 (1999).
13. V. Christou, T. Q. Ly, O. V. Salata, S. Capecchi, O. Renault, and M. Etchells, Society for Information Displays Technical Papers, 30, 568 (1999).
14. T. Q. Ly, V. Christou, S. Capecchi, A. Cowley, and A. M. Chippindale, Synth. Met. (in press).
15. O. V. Salata, S. Capecchi, O. Renault, M. Etchells, and V. Christou (unpublished).
16. S. M. Tadayyon, K. Griffiths, P. R. Norton, C. Tripp, and Z. Popovic, J. Vac. Sci. Technol. A 17, 1773 (1999).
17. Th. Kugler, Å. Johannson, I. Dalsegg, U. Gelius, and W. R. Salaneck, Synth. Met. 91, 143 (1997).
18. C. C. Wu, C. I. Wu, J. C. Sturm, and A. Kahn, Appl. Phys. Lett. 70, 1348 (1997).
19. Y. Park, V. Choong, Y. Gao, B. R. Hsieh, and C. W. Tang, Appl. Phys. Lett. 68, 2669 (1996).
20. K. Sugiyama, H. Ishii, Y. Ouchi, and K. Seki, J. Appl. Phys. 87, 295 (2000).
21. D. J. Milliron, I. G. Hill, C. Shen, A. Kahn, and J. Schwartz, J. Appl. Phys. 87, 572 (2000).
22. F. Nuesch, L. J. Rothberg, E. W. Forsythe, Q. T. Lee, and Y. L. Gao, Appl. Phys. Lett. 74, 880 (1999).
23. M. G. Mason, L. S. Hung, C. W. Tang, S. T. Lee, K. W. Wong, and M. Wang, J. Appl. Phys. 86, 1688 (1999).
24. R. G. Egdell, J. Rebane, T. J. Walker, and D. S. L. Law, Phys. Rev. B 59, 1792 (1999).
25. P. A. Cox, W. R. Flavell, and R. G. Egdell, J. Solid State Chem. 68, 340 (1987).
26. P. A. Cox, R. G. Egdell, A. F. Orchard, C. Harding, W. R. Patterson, and P. Tavener, Solid State Commun. 44, 837 (1982).
27. P. A. Cox, R. G. Egdell, C. Harding, W. R. Patterson, and P. Tavener, Surf. Sci. 123, 179 (1982).
28. R. G. Egdell, W. R. Flavell, and P. Tavener, J. Solid State Chem. 51, 345 (1984).
29. J. N. Chalzalviel, M. Campagna, and G. K. Wertheim, Phys. Rev. B 16, 697 (1977).