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Analytical Chemistry

Volumn 74, Issue 13, 2002, Pages 3127-3133

Influence of microstructure on the electrochemical performance of tin-doped indium oxide film electrodes

(5) Popovich, Natasha D a Wong, Sze Shun a Yen, Brian K H a Yeom, Hyo Young b Paine, David C b

a Xanthon Inc (United States)

b Brown University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

POLYCRYSTALLINE FILMS;

CHLORINE; CRYSTALLOGRAPHY; ELECTROCHEMISTRY; ELECTRON TRANSITIONS; MICROSTRUCTURE; SPUTTERING; SURFACE ROUGHNESS;

CHEMICAL ANALYSIS;

FERROCENE; FERROCYANIDE; INDIUM; METHANOL; OXIDE; RUTHENIUM DERIVATIVE; TIN;

ARTICLE; CHEMICAL REACTION KINETICS; CHEMICAL STRUCTURE; CRYSTALLIZATION; DENSITY; ELECTROCHEMISTRY; ELECTRODE; ELECTRON TRANSPORT; FILM; OXIDATION REDUCTION REACTION; SURFACE PROPERTY;

EID: 0036646567 PISSN: 00032700 EISSN: None Source Type: Journal
DOI: 10.1021/ac011168l Document Type: Article

Times cited : (34)

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