Plasma treatments of indium tin oxide anodes in carbon tetrafluorinde (CF4)/oxygen (O2) to improve the performance of organic light-emitting diodes

Thin Solid Films

Volumn 444, Issue 1-2, 2003, Pages 254-259

  Chan, I Min ^a   Hong, Franklin Chau Nan ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Indium tin oxide; Optoelectronic device; Plasma processing and deposition

Indexed keywords

ANODES; LIGHT EMITTING DIODES; PLASMAS; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA PROCESSING;

INDIUM COMPOUNDS;

EID: 0142011464     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01197-0     Document Type: Article

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