Reactive deposition of conformal metal oxide films from supercritical carbon dioxide

Chemistry of Materials

Volumn 19, Issue 23, 2007, Pages 5460-5466

  O'Neil, Adam ^a   Watkins, James J ^a  

^a UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH OXIDES; COLD WALL REACTORS; ETCHED SILICON WAFERS; REACTIVE DEPOSITION;

CARBON DIOXIDE; CHEMICAL REACTIONS; CONFORMAL MAPPING; ETCHING; SILICON WAFERS; SUPERCRITICAL FLUIDS;

OXIDE FILMS;

EID: 36348970104     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm070288s     Document Type: Article

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