Electrical characteristics of thin cerium oxide film on silicon substrate by reactive DC sputtering

Electrochemical and Solid-State Letters

Volumn 4, Issue 9, 2001, Pages

  Pan, Tung Ming ^a   Chien, Chao Hsin ^b   Lei, Tan Fu ^a   Chao, Tien Sheng ^b   Huang, Tiao Yuan ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b National Nano Device Labratories   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; ELECTRIC PROPERTIES; LEAKAGE CURRENTS; PERMITTIVITY; SEMICONDUCTING SILICON; SILICON NITRIDE; SPUTTERING; THICKNESS MEASUREMENT; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CERIUM OXIDE; REACTIVE SPUTTERING; ULTRALARGE SCALE INTEGRATION DEVICES;

CERIUM COMPOUNDS;

EID: 0035469725     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1387225     Document Type: Article

References (10)