Thin Film Growth and Microstructure Analysis of CeO2 Prepared by MOCVD

Chemical Vapor Deposition

Volumn 2, Issue 5, 1996, Pages 191-197

  Becht, Michael ^a   Morishita, Tadataka ^a  

^a SUPERCONDUCTIVITY RESEARCH LABORATORY   (Japan)

Author keywords

CeO2; MOCVD; SEM; Surface morphology; Thin film

Indexed keywords

CERIUM COMPOUNDS; COMPOSITION EFFECTS; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; FILM GROWTH; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE STRUCTURE; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CERIUM DIOXIDE THIN FILMS; OXYGEN PARTIAL PRESSURE;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0030232307     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.19960020508     Document Type: Article

References (26)

1. H. Koinuma, MRS Bull. 1994, 19, 21.
2. R. G. Schwab, R. A. Steiner, G. Mages, H. J. Beie, Thin Solid Films 1992, 207, 283.
3. R. G. Schwab, R. A. Steiner, G. Mages, H. J. Beie, Thin Solid Films 1992, 207, 288.
4. S. Guo, H. Arwin, S. N. Jacobson, K. Järrendahl, U. Helmersson, J. Appl. Phys. 1995, 77, 5369.
5. J. M. Phillips, Appl. Phys. 1996, 79, 1829.
6. G. L. Skofronick, A. H. Carim, S. R. Folty, R. E. Muenchhausen, J. Mater. Res. 1993, 8, 2785.
7. F. Wang, R. Wördenweber, Thin Solid Films 1993, 227, 200.
8. R. Aguiar, F. Sánches, D. Peiró, C. Ferrater, M. Varela, Physica C 1994, 235-240, 647.
9. T. Inoue, Y. Yamamoto, M. Satoh, T. Ohsuna, H. Myoren, T. Yamashita, Mater. Res. Soc. Symp. Proc. 1994, 341, 101.
10. H. Mölsä, L. Niiströ, Mater. Res. Soc. Symp. Proc. 1994, 335, 341.
11. S. Lee, S. Oh, D. Goo, D. Youm, Thin Solid Films 1995, 258, 299.
12. M. Yoshimoto, K. Shimozono, T. Maeda, T. Ohnishi, M. Kumagai, T. Chikyow, O. Ishiyama, O. Shinohara, H. Koinuma, Jpn. J. Appl. Phys. 1995, 34, L688.
13. Z. Lu, R. Hiskes, S. A. DiCariolis, A. Nel, R. K. Route, R. S. Feigelson, J. Cryst. Growth 1995, 156, 227.
14. M. Becht, T. Gerfin, K. H. Dahmen, Chem. Mater. 1993, 5, 137.
15. S. Liang, C. S. Chern, Z. Q. Shi, P. Lu, B. H. Kear, J. Cryst. Growth 1995, 151, 359.
16. K. H. Dahmen, T. Gerfin, Prog. Cryst. Growth Charact. Mater. 1993, 27, 117.
17. J. Arndt, L. Klippe, R. Stolle, G. Wahl, J. Physique IV 1995, C5, 119.
18. M. Becht, K. H. Dahmen, F. Atamny, A. Baiker, Fresenuis J. Anal. Chem. 1995, 353, 718.
19. T. Ozawa, Thermochim. Acta 1991, 174, 185.
20. P. F. Miceli, C. J. Palmstrøm, K. W. Moyers, in X-Ray Bragg Reflectivity of ErAs Epitaxial Films (Eds: H. Zabel, I. K. Robinson), Springer, Berlin 1992, p. 203.
21. R. Sum, H. P. Lang, H.-J. Güntherodt, Physica C 1995, 242, 174.
22. X. D. Wu, S. R. Foltyn, P. N. Arendt, W. R. Blumenthal, I. H. Campbell, J. D. Cotton, J. Y. Coulter, W. L. Hulys, M. P. Maley, H. F. Safar, J. L. Smith, Appl. Phys. Lett. 1995, 67, 2397.
23. T. Yamaguchi, Y. Iijima, N. Hirano, S. Nagaya, O. Kohno, Jpn. J. Appl. Phys. 1994, 33, 6150.
24. C. V. Thompson, R. Carel, Mater. Sci. Eng. 1995, B32, 211.
25. A. J. Dammers, S. Radelaar, Mater. Sci. Forum 1992, 94, 345.
26. R. Messier, J. Vac. Sci. Technol. A 1995, 4, 490.