Molecular weight and processing effects on the dissolution properties of thin poly(methyl methacrylate) films

Microelectronic Engineering

Volumn 85, Issue 1, 2008, Pages 93-99

  Kokkinis, A ^a   Valamontes, E S ^b,c   Goustouridis, D ^a   Ganetsos, Th ^d   Beltsios, K ^e   Raptis, I ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b UNIVERSITY OF PELOPONNESE   (Greece)

^c TEI of Athens ^*  (Greece)

^d TEI of Lamia   (Greece)

^e UNIVERSITY OF IOANNINA   (Greece)

Author keywords

Dissolution; Lithography; Multiwavelength interferometry; Poly(methyl methacrylate); Thin film

Indexed keywords

DISSOLUTION; LITHOGRAPHY; MOLECULAR WEIGHT; SWELLING; THIN FILMS;

EXPOSURE DOSES; MULTIWAVELENGTH INTERFEROMETRY; PMMA MOLECULAR WEIGHTS;

POLYMETHYL METHACRYLATES;

EID: 36248931576     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.04.141     Document Type: Article

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