Nonstatistical degradation and development characteristics of poly(methylmethacrylate) based resists during electron beam exposure

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 2968-2973

  Uhl, A ^a   Bendig, J ^a   Leistner, J ^a   Jagdhold, U ^b   Bauch, L ^b   Bottcher M ^c  

^a HUMBOLDT UNIVERSITY   (Germany)

^b IHP   (Germany)

^c Vistec Electron Beam GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042877248     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590327     Document Type: Article

References (13)

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