Development and molecular-weight issues on the lithographic performance of poly (methyl methacrylate)

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 244-251

  Olzierski, A ^a   Raptis, I ^a  

^a INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

Development rate; Dissolution rate monitor; Electron beam lithography; Poly (methyl methacrylate)

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FIELD EFFECT TRANSISTORS; LITHOGRAPHY; MOLECULAR WEIGHT; PROPYLENE; SPIN COATING;

DEVELOPMENT RATE; DISSOLUTION RATE MONITOR;

POLYMETHYL METHACRYLATES;

EID: 17344388282     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00106-6     Document Type: Conference Paper

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