Fidelity of rectangular patterns printed with 0.3-NA MET optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Tanaka, Yuusuke ^a   Kikuchi, Yukiko ^a   Goo, DooHoon ^a   Nishiyama, Iwao ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Acid; Diffusion length; EUVL; Fidelity; MET; MET 1K; PEB; Rectangular pattern; Resist; Shortening

Indexed keywords

COMPUTER SIMULATION; IMAGE ANALYSIS; PHOTORESISTS; THERMAL EFFECTS;

ACID DIFFUSION; DIFFUSION LENGTH; PATTERN FIDELITY; RECTANGULAR PATTERN;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148887634     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711900     Document Type: Conference Paper

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