Capability of 70 nm pattern replication in X-ray lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 3 A, 2001, Pages 1227-1235

  Kikuchi, Y ^a   Matsui, Y ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

C H; CD; Contrast; DOF; Dose; DRAM; Exposure latitude; F2; Gap; L S; Lithography; Mask; NA; Resist; X ray

Indexed keywords

CONTRAST MEDIA; IMAGE ANALYSIS; MASKS; PHOTORESISTS;

PATTERN REPLICATION;

X RAY LITHOGRAPHY;

EID: 0035269783     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.1227     Document Type: Article

References (25)