Modeling of EUV photoresists with a resist point spread function

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 1101-1109

  Cain, Jason P ^a,c   Naulleau, Patrick ^b   Spanos, Costas J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c ADVANCED MICRO DEVICES   (United States)

Author keywords

Aerial image contrast; Contrast transfer function (CTF); EUV 2D; Extreme ultraviolet (EUV) lithography; KRS; MET 1K; Microexposure tool (MET) optic; Photoresist point spread function; Synchrotron

Indexed keywords

AERIAL IMAGE CONTRAST; CONTRAST TRANSFER FUNCTION (CTF); EUV-2D; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; KRS; MET-1K; MICROEXPOSURE TOOL (MET) OPTIC; PHOTORESIST POINT SPREAD FUNCTION;

COMPUTER SIMULATION; EXTRACTION; LIGHT SOURCES; LITHOGRAPHY; OPTICAL DEVICES; SPUTTERING; SYNCHROTRONS; ULTRAVIOLET RADIATION;

PHOTORESISTS;

EID: 24644454229     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600439     Document Type: Conference Paper

References (9)

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