CD-bias evaluation and reduction in CD-SEM linewidth measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 3, 2007, Pages

  Tanaka, Maki ^a   Shishido, Chie ^a   Nagatomo, Wataru ^a   Watanabe, Kenji ^b  

^a HITACHI LTD   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

Accuracy; CD SEM; LER compensation; Model based library approach; Monte Carlo simulation; Noise reduction; Precision; Relative accuracy; Shape dependent measurement bias

Indexed keywords

ALGORITHMS; ELECTRON BEAMS; IMAGE PROCESSING; INFORMATION ANALYSIS; LINEWIDTH; NOISE ABATEMENT; SCANNING ELECTRON MICROSCOPY; SIGNAL TO NOISE RATIO; THREE DIMENSIONAL;

CD-BIAS EVALUATION; CD-SEM LINEWIDTH MEASUREMENTS; CRITICAL-DIMENSION SCANNING ELECTRON MICROSCOPY (CD-SEM); ELECTRON-BEAM-INDUCED DAMAGE; LINE EDGE ROUGHNESS (LER); MODEL-BASED LIBRARY (MBL);

LITHOGRAPHY;

EID: 35148840218     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.710803     Document Type: Conference Paper

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