193 nm CD shrinkage under SEM: Modeling the mechanism

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 92-101

  Habermas, Andrew ^a   Hong, Dongsung ^a   Ross, Matthew ^b   Livesay, William ^b  

^a CYPRESS SEMICONDUCTOR   (United States)

^b Electron Vision Corp San Diego   (United States)

Author keywords

193 nm photoresist; Electron; Linewidth slimming; SEM; Shrinkage

Indexed keywords

COMPUTER SIMULATION; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MONTE CARLO METHODS; SCANNING ELECTRON MICROSCOPY;

LINEWIDTH SLIMMING;

PHOTOLITHOGRAPHY;

EID: 0036031377     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473436     Document Type: Article

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