Influence of focus variation on line width measurements

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue I, 2005, Pages 144-155

  Tanaka, Maki ^a,b   Villarrubia, John S ^b   Vladár, András E ^b  

^a HITACHI LTD   (Japan)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

CD SEM; Image focus variation; Image resolution; Measurement error; Model based library

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; EDGE DETECTION; MEASUREMENT ERRORS; OPTICAL RESOLVING POWER; POLYSILICON; REGRESSION ANALYSIS; SCANNING ELECTRON MICROSCOPY;

IMAGE FOCUS VARIATION; IMAGE RESOLUTION; LINEWIDTH MEASUREMENTS; MODEL-BASED LIBRARY;

OPTICAL VARIABLES MEASUREMENT;

EID: 24644521016     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599741     Document Type: Conference Paper

References (15)

1. International Technology Roadmap for Semiconductors 2004 Update, (Semiconductor Industry Association, 2004), Table 117a, Metrology Section, p. 5.
2. M. Sato, "Resolution," in Handbook of Charged Particle Optics, J.Orloff, ed., (CRC Press, Boca Raton, FL, pp. 319-361, 1997).
3. T. Ishitani and M. Sato, "Contrast-to gradient method for the evaluation of image resolution in scanning electron microscopy," Journal of Electron Microscopy 51(6), pp. 369-382, 2002.
4. D. C. Joy, Y. Ko, and J. J. Hwu, "Metrics of resolution and performance for CD-SEMs," Proceedings of the SPIE, Vol. 3998, pp. 108-114, 2000.
5. N. F. Zhang, M. T. Postek, R. D. Larrabee, A. E. Vladár, W. J. Keery, and S. N. Jones, "Image Sharpness Measurement in the Scanning Electron Microscope - Part III," SCANNING Vol. 21, pp. 246-252, 1999.
6. J. S. Villarrubia, A. E. Vladar, and M. T. Postek, "A Simulation study of repeatability and bias in the CD-SEM," Proceedings of the SPIE, Vol. 5038, pp. 138-149, 2003.
7. M. P. Davidson and A. E. Vladar, "An inverse scattering approach to SEM line width measurement," Proceedings of the SPIE, Vol. 3677, pp. 640-649, 1999.
8. J. S. Villarrubia, A. E. Vladár, J. R. Lowney, and M. T. Postek, "Scanning electron microscope analog of scatterometry," Proceedings of the SPIE, Vol. 4689, pp. 304-312, 2002.
9. J. R. Lowney, "Application of Monte Carlo simulations to critical dimension metrology in a scanning electron microscope," Scanning Microscopy, Vol. 10, pp. 667-678, 1996.
10. P. R. Bevington and D. K. Robinson, Data Reduction and Error Analysis for the Physical Sciences, 3rd edition, (McGraw-Hill Companies, Inc., New York, 2003).
11. W. H. Press, B. P. Flannery, S. A. Teukolsky, and W. T. Vetterling, Numerical Recipes in C, (Cambridge University Press, Cambridge, 1988).
12. Certain commercial equipment is identified in this report in order to describe the experimental and analytical procedures adequately. Such identification does not imply recommendation or endorsement by NIST, nor does it imply that the equipment identified is necessarily the best available for the purpose.
13. J. S. Villarrubia, A. E. Vladar, J. R. Lowney, and M. T. Postek, "Edge Determination for Polycrystalline Silicon Lines on Gate Oxide," Proc. SPIE Vol. 4344, pp. 147-156, 2001.
14. rd edition, (Kluwer Academic/Plenum Publishers, New York, 2003).
15. Information about the gold on carbon sample is shown in http://www.2spi.com/catalog/standards/stndcal4.shtml.