Cross-sectional gate feature identification using top-down SEM images

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 624-635

  Tanaka, Maki ^a   Shishido, Chie ^a   Takagi, Yuji ^a   Morokuma, Hidetoshi ^b   Komuro, Osamu ^b   Mori, Hiroyoshi ^b  

^a HITACHI LTD   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

3 dimensional evaluation; Bottom corner roundness; Critical dimension scanning electron microscopy (CD SEM); Etched gate structure; Image analysis; Sidewall angle; Top down view

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; ETCHING; FEATURE EXTRACTION; IMAGE ANALYSIS; POLYSILICON; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION; CROSS SECTIONAL GATE FEATURE IDENTIFICATION; FOOTING; ROUNDNESS;

LITHOGRAPHY;

EID: 0141611977     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483685     Document Type: Conference Paper

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