Dose and focus estimation using top-down SEM images

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 II, Issue , 2003, Pages 1071-1079

  Shishido, Chie ^a   Nakagaki, Ryo ^a   Tanaka, Maki ^a   Takagi, Yuji ^a   Morokuma, Hidetoshi ^b   Komuro, Osamu ^b   Mori, Hiroyoshi ^b  

^a HITACHI LTD   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

CD SEM; Image analysis; Photolithography; Process monitoring; Process window

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; CONDITION MONITORING; IMAGE ANALYSIS; PHOTORESISTS; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSION-SCANNING ELECTRON MICROSCOPY; EXPOSURE DOSE; FOCUS VARIATION; PROCESS MONITORING; PROCESS WINDOW;

PHOTOLITHOGRAPHY;

EID: 0141723532     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483673     Document Type: Conference Paper

References (7)

1. Chie Shishido et al., "Characterizing cross-sectional profile variations by using multiple parameters extracted from top-down SEM images," Proceedings of the SPIE, Vol.4689, pp. 653-660, 2002.
2. WenZhan Zhou et al., "Determination of DICD Best Focus by Top-down CD-SEM," Proceedings of the SPIE, Vol.4689, pp. 661-671, 2002.
3. Bo Su et al., "Sidewall Angle Measurements using CDSEM," Proceedings of Advanced Semiconductor Manufacturing Conference, pp.259-261, 1998.
4. Eric Solecky et al., "Three Dimensional Top Down Metrology: A Viable Alternative to AFM or Cross Section?," Proceedings of the SPIE, Vol.4344, pp. 366-376, 2001.
5. Bo Su et al., "Shape control using sidewall imaging," Proceedings of the SPIE, Vol.3998, pp. 232-238, 2000.
6. Thomas Marschner et al., "Determination of best focus and exposure dose using CD-SEM side-wall imaging," Proceedings of the SPIE, Vol.4344, pp. 355-365, 2001
7. J. I. Goldstein, D. E. Newbury, P. Echlin, D. C. Joy, C. Fiori, and E. Lifshin, Scanning Electron Microscopy and X-Ray Microanalysis, 2nd Edition, Plenum Press, New York (1984)