Characterizing cross-sectional profile variations by using multiple parameters extracted from top-down SEM images

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4689 II, Issue , 2002, Pages 653-660

  Shishido, Chie ^a   Takagi, Yuji ^a   Tanaka, Maki ^a   Komuro, Osamu ^a   Morokuma, Hidetoshi ^a   Sasada, Katsuhiro ^a  

^a HITACHI LTD   (Japan)

Author keywords

CD SEM; Image analysis; Lithography; Process monitoring

Indexed keywords

COMPUTER SIMULATION; IMAGE ANALYSIS; SCANNING ELECTRON MICROSCOPY; WAVEFORM ANALYSIS;

CROSS-SECTIONAL PROFILES;

PHOTORESISTS;

EID: 0036030705     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.473507     Document Type: Conference Paper

References (7)

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