Inverse scattering approach to SEM line width measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue II, 1999, Pages 640-649

  Davidson, Mark P ^a   Vladar, Andras E ^a  

^a Spectel Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SOFTWARE; ELECTRON BEAMS; ELECTRON SCATTERING; FUNCTIONS; MATHEMATICAL MODELS; MONTE CARLO METHODS; POLYNOMIALS; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION SCANNING ELECTRON MICROSCOPY (CD SEM);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032678353     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350850     Document Type: Conference Paper

References (16)