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Volumn 19, Issue 4, 2006, Pages 501-506

Progress in EUV resist performance

a IMEC (Belgium)

Author keywords

EUV lithography; EUV resists; Flare; Interference lithography; Line edge roughness; Resist sensitivity

Indexed keywords

EID: 33748476635 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.19.501 Document Type: Article

Times cited : (21)

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