Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 854-860

  Chandhok, Manish ^a   Lee, Sang H ^a   Krautschik, Christof ^a   Zhang, Guojing ^a   Rice, Bryan J ^a   Goldstein, Michael ^a   Panning, Eric ^a   Bristol, Robert ^a   Stivers, Alan ^a   Shell, Melissa ^a  

^a INTEL CORPORATION   (United States)

Author keywords

ETS; EUV; Flare; FVC; MTF; Point Spread Function; PSF; Scatter

Indexed keywords

ENGINEERING TEST STAND (ETS); EXTREME ULTRAVIOLET (EUV); FLARE VARIATION COMPENSATION (FVC); PROJECTION OPTICS (PO);

COMPUTER SIMULATION; ERROR CORRECTION; FOURIER TRANSFORMS; LIGHT SCATTERING; MATHEMATICAL MODELS; MIRRORS; NATURAL FREQUENCIES; OPTICAL TRANSFER FUNCTION; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 3843135071     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535995     Document Type: Conference Paper

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